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CuCr target Copper-chromium target (MAT-CN)
Physical properties
Color
silver
Density
-g/m³
Melting point
-
Technical indicators
purity
99.99%
Relative density
>99.9%
Cut surface flatness
3.2Ra
Tolerance
±0.1mm
grain size
uniform
Material
CuCr
Brand
MAT-CN
Origin
Nanchang Jiangxi China
Specifications
Size 1: diameter <360mm
thickness> 1 mm
(wafer / round table / rod)
Size 2: length <300mm
width <300mm
thickness> 1mm
(rectangular / sheet /splicing)
Size 3: outer diameter <360mm
inner diameter> 1mm
length> 1 mm
(pipe / ring / rotatable targets)
Size 4:be customized according to user needs, sample processing, to map processing
Minimum order quantity
1 piece,large concessions
Supply capacity
the same batch, the same material, continuous and reliable supply; 100 kg / month min
Delivery time
3 weeks after payment,excluding special materials
Production process
vacuum levitation melting, casting into ingots, thermo-mechanical treatment and precision machining
Applicable instruments
various models magnetron sputtering equipment, etc.
Product uses
industrial-grade coating, experiments or research level CuCr target electronics, optoelectronics, military, decorative, functional film
Advantages
quality
1.reasonable price and good quality
2.high purity, less impurities
3.dense, rolling, oxidation, forming plasticizers
4.relatively high density, grain uniformity axis, consistency
The finishing surface CuCr Copper-chromium-sputtering target Ion Beam Sputtering