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Supplier Homepage > Products > sputtering target ITO (bonding Cu)99.99% Ion Beam Sputtering
sputtering target ITO (bonding Cu)99.99% Ion Beam Sputtering
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product: view count: 168sputtering target ITO (bonding Cu)99.99% Ion Beam Sputtering 
unit price: Negotiable
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period for delivery: Consignment Deadline days
Expiry date: Long Effective
last update: 2017-08-26 01:08
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ITO(In2O3+SnO2) target 99.99% Physical properties Color Gray Density 7.14g/ml Melting point 1500-1900 Technical indicators purity 99.99% Relative density >99% Cut surface flatness 3.2Ra Tolerance ±0.1mm grain size uniform Material ITO (In2O3+SnO2) Brand MAT-CN Origin Nanchang Jiangxi Specifications Size 01: diameter <360mm thickness> 1 mm (wafer / round table / rod) Size 02: length <300mm width <300mm thickness> 1mm (rectangular / sheet /splicing) Size 03: outer diameter <360mm inner diameter> 1mm length> 1 mm (pipe / ring / rotatable targets) Size 04: be customized according to user needs, sample processing, to map processing Minimum order quantity 1 piece, large concessions Supply capacity the same batch, the same material, continuous and reliable supply; 100 kg / month min Delivery time 3 weeks after payment,excluding special materials Production process vacuum levitation melting, casting into ingots, thermo-mechanical treatment and precision machining Applicable instruments various models magnetron sputtering equipment, etc. Product uses industrial-grade coating, experiments or research level ITO target, electronics, optoelectronics, military, decorative, functional film Product accessories formal quotation / purchase and sales contracts / packing list / material analysis detection of single / formal invoice Packing vacuum packaging / vacuum neutral packing / special packaging outside reinforcement package Mode of transport for domestic express carrier (SF, Shen Tong, EMS, Nadu --- safe, fast and reliable)
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